Comparative high-k material gate spacer impact in DG-FinFET parameter variations between two structures

по F. Roslan, Ameer, Salehuddin, F., M. Zain, A.S, Kaharudin, K.E, Ahmad, I., Hazura, H., Hanim, A.R, Idris, S.K
Опубликовано 2019

3D Double Gate FinFET Construction of 30 nm Technology Node Impact Towards Short Channel Effect

по F. Roslan, Ameer, Salehuddin, F., M.Zain, A.S, Kaharudin, K.E, Hazura, H., Hanim, A.R, Idris, S. K, Zarina, B.Z, Maheran A.H, Afifah
Опубликовано 2018