Plasma Science and Technology - Basic Fundamentals and Modern Applications

Usually called the ""fourth state of matter,"" plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the las...

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Main Author: Haikel Jelassi (auth)
Other Authors: Djamel Benredjem (auth)
Format: Book Chapter
Published: IntechOpen 2019
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Online Access:Get Fullteks
DOAB: description of the publication
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020 |a intechopen.72359 
020 |a 9781789852400 
020 |a 9781789852394 
024 7 |a 10.5772/intechopen.72359  |c doi 
041 0 |a English 
042 |a dc 
100 1 |a Haikel Jelassi  |4 auth 
700 1 |a Djamel Benredjem  |4 auth 
245 1 0 |a Plasma Science and Technology - Basic Fundamentals and Modern Applications 
260 |b IntechOpen  |c 2019 
300 |a 1 electronic resource (328 p.) 
506 0 |a Open Access  |2 star  |f Unrestricted online access 
520 |a Usually called the ""fourth state of matter,"" plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the last few decades, the physics and engineering of plasmas was experiencing a renewed interest, essentially born of a series of important applications such as thin-layer deposition, surface treatment, isotopic separation, integrated circuit etchings, medicine, etc. Plasma Science & Technology - Basic Fundamentals and Modern Applications presents the basic fundamentals behind plasma physics along with some of their most important modern applications. 
540 |a All rights reserved  |4 http://oapen.org/content/about-rights 
546 |a English 
653 |a Physical Sciences 
653 |a Engineering and Technology 
653 |a Plasma Physics 
653 |a Physics 
856 4 0 |a www.oapen.org  |u https://www.intechopen.com/books/plasma-science-and-technology-basic-fundamentals-and-modern-applications  |7 0  |z Get Fullteks 
856 4 0 |a www.oapen.org  |u https://directory.doabooks.org/handle/20.500.12854/56377  |7 0  |z DOAB: description of the publication