Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
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Other Authors: | Cameron, David (Editor) |
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Format: | Book Chapter |
Published: |
Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2020
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Online Access: | Get Fullteks DOAB: description of the publication |
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