Chapter Spatial Atomic Layer Deposition
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
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Main Author: | Jiménez, Carmen (auth) |
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Other Authors: | Bellet, Daniel (auth), Masse de la Huerta, César (auth), Muñoz-Rojas, David (auth), Huong Nguyen, Viet (auth) |
Format: | Book Chapter |
Published: |
InTechOpen
2019
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Online Access: | Get Fullteks DOAB: description of the publication |
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