Study of Different Parametric Variations of MOSFET Pressure Sensor

There is a growing demand of miniaturization of the electronics world. A brief discussion for simulating and fabrication of the MOSFET based pressure sensor in nanoscale is being reviewed in this paper. Aim of this paper is to collect all the scaling challenges and their solutions together to make u...

Full description

Saved in:
Bibliographic Details
Main Authors: Bhargava, Shruti (Author), Subbarao, Spv (Author)
Format: EJournal Article
Published: Institute of Advanced Engineering and Science, 2018-04-01.
Subjects:
Online Access:Get fulltext
Tags: Add Tag
No Tags, Be the first to tag this record!
LEADER 02014 am a22003013u 4500
001 ijeecs9612_8168
042 |a dc 
100 1 0 |a Bhargava, Shruti  |e author 
100 1 0 |e contributor 
700 1 0 |a Subbarao, Spv  |e author 
245 0 0 |a Study of Different Parametric Variations of MOSFET Pressure Sensor 
260 |b Institute of Advanced Engineering and Science,   |c 2018-04-01. 
500 |a https://ijeecs.iaescore.com/index.php/IJEECS/article/view/9612 
520 |a There is a growing demand of miniaturization of the electronics world. A brief discussion for simulating and fabrication of the MOSFET based pressure sensor in nanoscale is being reviewed in this paper. Aim of this paper is to collect all the scaling challenges and their solutions together to make understanding the facts of the MOSFET based sensor. As the MOSFET move from micro scale to nanoscale the functioning changes dramatically. The Silicon oxide material fails when scale down to nano region. However, many issues such as electrical quality , thermodynamic stability, Kinetic stability, gate compatibility and process compatibility were being solved in the process of integration and implementation. 
540 |a Copyright (c) 2018 Institute of Advanced Engineering and Science 
540 |a http://creativecommons.org/licenses/by-nc-nd/4.0 
546 |a eng 
690
690 |a High-k Metal Gate (HKMG), MOSFET, Short Channel Effect (SCE), Moore's Law, CMOS, Induced Barrier Lowering (DIBL), Hot Electron Effects (HECs). 
655 7 |a info:eu-repo/semantics/article  |2 local 
655 7 |a info:eu-repo/semantics/publishedVersion  |2 local 
655 7 |2 local 
786 0 |n Indonesian Journal of Electrical Engineering and Computer Science; Vol 10, No 1: April 2018; 19-26 
786 0 |n 2502-4760 
786 0 |n 2502-4752 
786 0 |n 10.11591/ijeecs.v10.i1 
787 0 |n https://ijeecs.iaescore.com/index.php/IJEECS/article/view/9612/8168 
856 4 1 |u https://ijeecs.iaescore.com/index.php/IJEECS/article/view/9612/8168  |z Get fulltext