Extremely Wetting Pattern by Photocatalytic Lithography and Its Application

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Bibliographic Details
Main Authors: Yuekun Lai (Author), Changjian Lin (Author), Zhong Chen (Author)
Format: Ebooks
Published: IntechOpen, 2011-12-02.
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042 |a dc 
100 1 0 |a Yuekun Lai  |e author 
700 1 0 |a Changjian Lin  |e author 
700 1 0 |a Zhong Chen  |e author 
245 0 0 |a Extremely Wetting Pattern by Photocatalytic Lithography and Its Application 
260 |b IntechOpen,   |c 2011-12-02. 
500 |a https://mts.intechopen.com/articles/show/title/extremely-wetting-pattern-by-photocatalytic-lithography-and-its-application 
540 |a https://creativecommons.org/licenses/by/3.0/ 
546 |a en 
690 |a Recent Advances in Nanofabrication Techniques and Applications 
655 7 |a Chapter, Part Of Book  |2 local 
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787 0 |n ISBN:978-953-307-602-7 
856 \ \ |u https://mts.intechopen.com/articles/show/title/extremely-wetting-pattern-by-photocatalytic-lithography-and-its-application  |z Get Online