Micro- and Nano-Fabrication by Metal Assisted Chemical Etching

Micro- and Nano-Fabrication by Metal Assisted Chemical Etching

Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...

Täydet tiedot

Tallennettuna:
Bibliografiset tiedot
Muut tekijät: Romano, Lucia (Toimittaja)
Aineistotyyppi: Kirjan osa
Julkaistu: Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
Aiheet:
History of engineering & technology
porous silicon
Pd nanoparticles-assisted chemical etching
etching rate
ethanol electrooxidation
X-ray diffractive optics
zone plate
high aspect ratio nanostructures
metal-assisted chemical etching
electroless deposition
Al2O3 nanotube
ultra-high aspect ratio
gold (Au) metal assisted chemical etching
atomic layer deposition
anisotropic dry etching
silicon cones
metal assisted chemical etching
transversal pores
antireflection
black GaAs
photon recycling
X-ray grating interferometry
catalyst
silicon
gold electroplating
magnetically guided metal-assisted chemical etching
bulk Si etching
curved Si structure
catalyst encapsulation
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