Micro- and Nano-Fabrication by Metal Assisted Chemical Etching

Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...

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מחברים אחרים:	Romano, Lucia (Editor)
פורמט:	Book Chapter
יצא לאור:	Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
נושאים:	History of engineering & technology porous silicon Pd nanoparticles-assisted chemical etching etching rate ethanol electrooxidation X-ray diffractive optics zone plate high aspect ratio nanostructures metal-assisted chemical etching electroless deposition Al2O3 nanotube ultra-high aspect ratio gold (Au) metal assisted chemical etching atomic layer deposition anisotropic dry etching silicon cones metal assisted chemical etching transversal pores antireflection black GaAs photon recycling X-ray grating interferometry catalyst silicon gold electroplating magnetically guided metal-assisted chemical etching bulk Si etching curved Si structure catalyst encapsulation n/a
גישה מקוונת:	Get Fullteks DOAB: description of the publication
תגים:	הוספת תג אין תגיות, היה/י הראשונ/ה לתייג את הרשומה!

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DOAB: description of the publication

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סימן המיקום:	A1234.567
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Micro- and Nano-Fabrication by Metal Assisted Chemical Etching

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