Spatial Atomic Layer Deposition
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
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| Main Authors: | , , , , |
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| Format: | Ebooks |
| Published: |
IntechOpen,
2019-01-10.
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| Subjects: | |
| Online Access: | Get Online |
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Internet
Get Online3rd Floor Main Library
| Call Number: |
A1234.567 |
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| Copy 1 | Available |