Spatial Atomic Layer Deposition
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
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Main Authors: | Muñoz-Rojas, David (Author), Nguyen, Viet Huong (Author), de la Huerta, César Masse (Author), Jiménez, Carmen (Author), Bellet, Daniel (Author) |
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Format: | Ebooks |
Published: |
IntechOpen,
2019-01-10.
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Subjects: | |
Online Access: | Get Online |
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